欢迎光临销售团队内部建设计划。安徽荣顺祥节能玻璃科技有限责任公司

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Photoresist Development Equipment

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Automatic coating and developing equipment Dual-1000

Since its establishment, Litho Tech Japan has focused on the research of lithography technology. It has a very comprehensive lithography technology, including hardware, software and processes, and provides high-performance lithography process equipment and photoresist analysis equipment. Become a wholly-owned subsidiary of VTEC in 2021, join the equipment and lithography technology business for semiconductor material production, research and development, continue to innovate, and provide products and services that meet customer needs
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Photoresist Development Equipment
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Contact Us Tel:86-021-643
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Product description

The equipment is equipped with a photoresist spin coating unit and a resist developing unit, and can freely combine a hot plate, a cooling plate, an HMDS processing unit, a clean substrate transfer robot, etc. According to customer needs, we can provide substrates as small as 2 inches or less and wafers as large as 300mm.

Be applicable:
1. Coating materials such as g-line / i-line photoresist, polyimide, interlayer insulating film, wax, etc.;
2. Chemical amplification coating materials such as EB photoresist, EUV photoresist, ArF / KrF photoresist;
3. Use alkaline developer and organic developer for immersion development and spray development.

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    Weidong Technology (Shanghai) Co., Ltd.

    Add: Room 1402, Block C, No. 70, Caobao Road, Xuhui District, Shanghai

    Copyright © 2021 Weidong Technology (Shanghai) Co., Ltd.    京ICP証000000號

    Copyright © 2021 Weidong Technology (Shanghai) Co., Ltd.

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